Determintation of the thickness of thin metal films by the interference effect on selenium films
DOI: 10.54647/physics140654 36 Downloads 3067 Views
Author(s)
Abstract
Current trends in the development of thin-film technologies and the semiconductor industry lead to a decrease in the characteristic dimensions of the structures being created, which places increased demands on the control of their geometric characteristics - layer thicknesses. Methods for determining the thickness of thin metal films are considered. Thin films of amorphous selenium, silver and silver layers on a selenium film are synthesized. Optical transmission spectra are recorded using a UV-vis spectrophotometer. A new method for determining the thickness of thin metal films by the interference effect on certain thicknesses of selenium films is proposed. The corresponding calculations are carried out.
Keywords
thin-film systems, selenium films, thin metal films, silver, interference maxima, spectrophotometry, film electrodes for capacitors, measurement of metal film thicknesses
Cite this paper
A.V.Smirnov, A.A. Terentyev, S.A. Vasilyev, N.I Koltcov,
Determintation of the thickness of thin metal films by the interference effect on selenium films
, SCIREA Journal of Physics.
Volume 9, Issue 6, December 2024 | PP. 216-223.
10.54647/physics140654
References
[ 1 ] | Thompkins, H. G., & McGahan, W. A. (1999). Spectroscopic Ellipsometry and Reflectometry: A User’s Guide (Vol. 4, pp. 35–53). Wiley. |
[ 2 ] | Vol’pyan, O. D., & Yakovlev, P. P. (2004). Determining the parameters of optical thin films by a spectrophotometric method. Journal of Optical Technology, 71(12), 847–848 |
[ 3 ] | Henrie, J., Parsons, E., Hawkins, A. R., & Schultz, S. M. (2005). Spectrum sampling reflectometer. Surface and Interface Analysis, 37, 568–572 |
[ 4 ] | Kutavichus, V. P., Filippov, V. V., & Huzouski, V. H. (2006). Determination of optical parameters and thickness of weakly absorbing thin flims from reflectance and transmittance spectra. Applied Optics, 45(19), 4547–4553. |
[ 5 ] | Ghim, Y.-S., & Kim, S.-W. (2009). Spectrally resolved white-light interferometry for 3D inspection of a thin-film layer structure. Applied Optics, 48(4), 799–803. |
[ 6 ] | Hlubina, P., Luňáček, J., Ciprian, D., & Chlebus, R. (2008). Spectral interferometry and reflectometry used to measure thin films. Applied Physics B, 92, 203–207. |
[ 7 ] | Kwon, U., & Joo, K.-N. (2022). Dual optical measurement probe system for double-sided film structure. International Journal of Precision Engineering and Manufacturing, 23(10), 1123–1131. |
[ 8 ] | Kim, M. (2020). Improved measurement of thin film thickness in spectroscopic reflectometer using convolutional neural networks. International Journal of Precision Engineering and Manufacturing, 21, 219–225. |
[ 9 ] | I. Shih, C.X. Qiu, S.K. Zhang, J.K. Chen. Deposition of selenium films from aqueous solutionю Materials Letters. Volume 3, Issues 5–6, April 1985, Pages 226-229 |
[ 10 ] | Kokshina A.V. Belova A.V. Krasnova A.G. Kochakov V.D. Optical methods for studying thin films. / Methodological manual. Electronic version. Ulyanov ChSU – 2013 |
[ 11 ] | Lee, C. C., Wang, D. L., Chen, C. C., Chang, J. Y., Pong, B. J., Chi, G. C., & Wu, L.-W. (2006). Light extraction enhancement of InGaN MQW by reducing total internal reflection through surface plasmon effect. Sixth International Conference on Solid State Lighting. |